U7-S08. Fabrication of Chromium masks (Remote) OUTSTANDING
Fabrication of Chromium masks
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Fabrication of Chromium masks
Fabrication of structures on diferent substrates, with diferent sizes and features by using diferent techniques such as: RIE, wet etching, etc.
Replication of nanostructures on polymers using controlled pressure and temperature. The sructres can be cured by heat (Thermal NIL) or UV light (step-and-flash lithography – SFIL) during the imprinting process.
This technique is widely used for microstructure fabrication for electrical, optical, photonic and biological applications.
Manufacturing of micro- and nano-structures using e-beam lithography in combination with other cleanroom techniques.
Topographical and morphological characterization of samples (nanostructures, materials, cells, tissues, etc.).
Training in the use of: interferometer, optical microscop, spin-coater, plasma cleaner and UV optical litography
Measurements of specific density using a helium pycnometer
Measurements of s packed (tapped) density using an Autotap analyzer.
Sample analysis Thermal analysis of solid materials (differential scanning calorimetry, DSC).